Tousimis Autosammdri-931 Cleanroom Edition Touchscreen Fully Automatic Critical Point Drying Instrument from the United States

Tousimis Autosammdri-931 Cleanroom Series from the United States

Touch screen fully automatic critical point dryer

This series is a desktop critical point dryer that can work in ultra clean rooms and has three models to choose from:

1) Autosamdri-931_1.25 ", used for 1" wafer critical point drying

2) Autosamdri-931_2.50 ", used for critical point drying of wafers not exceeding 2"

3) Autosamdri-931_3.40 ", used for critical point drying of wafers not exceeding 3"

Principle of critical point drying
The reason why it is called critical point drying (also known as supercritical drying) is because it has continuity of state, that is, the medium has no significant difference between liquid and gas, and the surface stress at the interface is reduced to zero. This phenomenon has a specific temperature and pressure, known as the critical point. The condition of zero surface stress can be used for drying biological samples or aqueous material samples, avoiding damage to the samples caused by surface stress.
We often need to perform dehydration treatment (gradient dehydration) when preparing biological samples or aqueous material samples under electron microscopy (scanning electron microscopy transmission electron microscopy), but the critical point of water is+374 ℃ and 3212 psi, which is inconvenient and prone to damage the sample. CO2 is usually a very convenient critical point drying medium, with a critical point at+31 ℃ and 1072 psi. However, it is not easy to mix with water, so a third medium must be used, usually ethanol or acetone as an intermediate liquid. In this way, when converting the transition liquid, i.e. CO2, from liquid to gas, there is no surface stress on the sample at the critical point.

Features and advantages

Anti static devicesSuitable for clean room material manufacturing applications

⊙ Bright touch screen control

The default "automatic mode" setting is suitable for most wafer and die MEMS applications

Capable of processing up to 5 substrates (wafers or bare chips) at a time

Create and store user-defined programs for different samples

The 'slow charging' function can protect most fragile samples

⊙ Rapid cooling chamber (cooling from 25 ° C to 3 ° C within 1 to 3 minutes)

Using maintenance free eddy current rotation method for displacement mixing, without the need for mixing rods

External replaceable 0.5 µ m replacement filter for easy maintenance

Equipped with a fluorine resistant sample rack, different chambers can be selected for drying wafers with diameters of 3 "and 2" or square wafers with a side length of 10mm

For liquid CO supplied from external steel cylinders₂Perform particle filtration with a retention rate of over 99.5%

Internal filtration can remove the filtered liquid CO₂Directly transported to the working chamber, with particle filtration as low as 0.08 µ m and a retention rate of over 99.999%

Equipped with a built-in condenser, it separates waste ethanol and carbon dioxide, eliminates any pipeline freezing or static electricity in the body, and the entire process is noise free

❖ "Stasis software", drying gel and other complex samples

Main technical specifications

➢ Working chamber size: There are three chamber diameters to choose from: 1.25 ", 2.50", 3.40“

Pressure measurement range: 0-2000psi

Temperature measurement range:- 30°C to 60°C

➢ Control mode: Touch screen fully automatic program control

conventional arrangement

✓ Flexible high-pressure liquid CO2 supply hose, easy to install on site

✓ Liquid CO2 system transportation filtration

✓ Fluorine resistant sample rack: used for drying 3 "and 2" wafers or square bare wafers with a side length of 10mm based on chambers of different sizes

✓ Flexible exhaust pipe is easy to install

✓ Spare chamber O-ring, chamber light, and fuse

Note:Tousimis products from the United States have a history of nearly 50 years and have a very good reputation among Chinese customers. Qinsi Technology is the agent of its CPD supercritical dryer in China. TousimisCritical point dryerProducts are divided intoNon cleanroom versionandCleanroom versionTwo major categories,The former is commonly used for electron microscopy sample preparation, while the latter is mostly used for material research in ultra clean rooms;

Non cleanroom versionThere are a total of 7 types of CPD:

1）Samdri ®- PVT-3D Conventional Critical Point Drying Instrument

2）Samdri ®- 795 semi-automaticCritical point dryer

3）Autosamdri ®- 815 Series A Fully Automatic Critical Point Drying Instrument

4）Autosamdri ®- 815B Series AFully automatic critical point dryer

5）Autosamdri ®- nine hundred and thirty-one_1.25"touch screenfully automaticCritical point dryer

6）Autosamdri ®- 931_2.50"touch screenfully automaticCritical point dryer

7）Autosamdri ®- 931_3.40"touch screenfully automaticCritical point dryer

Cleanroom versionThere are a total of 9 types of CPD:

1）Autosamdri ®- 815 Series BFully automatic critical point dryerFor Die & 1”Wafers

2）Autosamdri ®- 815B Series BFully automatic critical point dryerFor 4”Wafers

3）Automegasamdri ®- 915B, Series BFully automatic critical point dryer for 6 "Wafers

4）Autosamdri ®- nine hundred and thirty-one_1.25"touch screenFully automatic multi-purposeCritical point dryer

5）Autosamdri ®- 931_2.50"touch screenFully automatic multi-purposeCritical point dryer

6）Autosamdri ®- 931_3.40"Multi purpose touch screenfully automaticCritical point dryer

7）Autosamdri ®- nine hundred and thirty-fourTouchscreen C seriesfully automaticCritical point dryer

8）Automegasamdri ®- nine hundred and thirty-sixTouchscreen C seriesfully automaticCritical point dryer

9）Automegasamdri ®-938Touchscreen C seriesfully automaticCritical point dryer

Tousimis supercritical dryer widely used in the United StatesIt is suitable for biological samples, gel and other fragile and complex samples with micro nano 3D structures, as well as MEMS MOF、 The critical point drying of material samples such as carbon nanotubes, graphene, and semiconductor wafers (with a maximum sample size of 8 inches, drying 5 pieces at a time). The principle of using CO2 critical point state without liquid phase surface tension to cause sample shrinkage deformation to obtain dry samples with real morphology is an effective method for drying and preparing biological samples such as cell tissues and semiconductor material samples containing water or other liquids; It has the characteristics of easy operation, precise control, and repeatable results. Customers can choose different models based on different applications.