Ppm level micro oxygen measurement system for semiconductor heat treatment process

German MESA Micro Oxygen Measurement SystemA heat treatment process specifically designed for the semiconductor production process.

German MESA Micro Oxygen Measurement SystemIt is a precision system that extracts gas into a specially designed measurement chamber and then uses a Lambda probe to measure micro oxygen at a stable and controlled temperature. It can output analog signals corresponding to ppm oxygen content.

Range: 0... 5/10/100/10000 ppm

Accuracy: ± 1% FS

Advantage: Four point correction

Output: 0 (4)... 20mA or 0... 10V

Origin: Germany (ISO 9001:2015 certified)

Applicable industry: Semiconductor

Main customer: Mattson

German MESA Micro Oxygen Measurement SystemDesigned with zirconia probe (Lambda probe), it can maintain a constant measurement temperature of 600 ℃ without being affected by furnace temperature. The Lambda probe works stably and has a longer service life than other similar products, with an actual service life of up to 10 years;

German MESA Micro Oxygen Measurement SystemEach Lambda probe has its unique zero drift coefficient K1 and temperature compensation coefficient K2, making the measurement signal output by the smart power supply more accurate.Range and output type are optional. The measurement results can also be connected to the upper computer through interfaces such as RS232/RS485 to achieve centralized control function.