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Nanjing Qinsi Technology Co., Ltd
JC Nabity Electron Beam Exposure System (NPGS Nanographic Generator)
NegotiableUpdate on 05/10
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Overview
Since its establishment in the 1980s, JC Nabity Lithography Systems in the United States has been committed to the development of electron beam lithography devices based on commercial SEM, STEM, or FIB. Its Nanometer Pattern Generation System (NPGS, also known as electron beam lithography system) technology is leading the industry in similar systems worldwide. More and more users around the world, including universities, research institutions, and government laboratories, are using NPGS for EBL research
Product Details
NPGS V9.1 Electron Beam Exposure System Modified Based on SEM/FIB
1) NPGS is based on existing SEM, STEM, FIB, etc., and is equipped with an electron beam control system. It controls the vector scanning of the electron beam in the mirror through a computer interface to directly engrave graphics.
2) The NPGS system combines the observation function of the original SEM. It does not affect the functionality of SEM itself.
3) Powerful functionality, easy operation, and flexible use.
4) NPGS can be paired with mainstream SEM or FIB today.
NPGS V9.0 is a software program that can control the electron beam of a scanning electron microscope. Electron beam exposure based on electron microscopy can be divided into two parts: engraving design and graphic operation. Engraving design is done through the randomly provided Design CAD program by NPGS. This CAD program has been modified to include commands for electron beam exposure. Graphic operation includes setting parameters for NPGS to calculate the position and exposure time of each point on the graphic.
NPGS hardware board: The customized mirrorless board is installed based on a high-speed PCIe slot inside a computer workstation. The main features are:
1. Adopting 16 bit high-speed analog-to-digital conversion output, X and Y dual channels output simultaneously, synchronous scanning frequency of 5 MHz, compatible with 6MHz, minimum increment of electron beam dwell time of 0.5 nanoseconds, and this resolution can be achieved at all frequencies.
2. Engraving scanning methods: vector scanning method and bitmap scanning method.
3. Integrated electron beam shutter control output.
4. The image acquisition adopts an integrated 16 bit analog-to-digital conversion input.
5. Based on PCIe slots, easy installation and reliable operation.
Electron beam blocker (beam gate): electric field type high-speed beam gate. The NPGS system also supports beamless operation.
Picoammeter: An electron beam exposure system based on SEM requires a picoammeter that can accurately read the electron beam current striking the sample. Usually, a picoammeter needs to be connected to the sample current output from outside the electron microscope stage.
Electron microscope beam current: NPGS can be optionally connected to control Faraday cup and/or read from picoammeter, but most users will use manually controlled Faraday cup and picoammeter.
Electron microscope parameters and electric stage control: Several universal electron microscope digital drivers and stage drivers are provided for free. If there is a serial communication protocol, this system supports any external control.
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