Electron beam shutter

britainDEBEN electron beam shutter

Many scanning electron microscopes have built-in beam gates that block the electron beam by using a tube scanning coil. Although this method is suitable for certain applications, the electron beam blocking speed is usually slow, only on the order of a few milliseconds; If faster blanking blocking speed is required, a separate high-speed electrostatic field type beam gate should be installed.

britainDebenProduced byPCDType beam brake is designed to provideJEOLandHitachiofFEGField launchLaB6Lanthanum hexaboride and tungsten filament scanning electron microscopy provide electron beam blanking (blocking, switching), pulse or other modulation capabilities. The beam gate is installed on the side of the electron microscope tubePCDOn the port (opposite to the final aperture stop), it can reach up to30Working under the acceleration voltage of kilovolt electron microscope, the switching time is about50Nanoseconds. It also has an integrated Faraday cup and probe current detector（PCD）Used to indicate probe current. If more accurate beam reading is required, the provided one can be usedBNCConnect the connector to the optional probe ammeter (see "Five level Beam Current Meter" at the end of this page).

The deflection plate mechanism can be inserted into the central axis of the lens barrel and can be completely withdrawn when not needed. The beam gate plate is made of cobalt gold coated phosphor bronze to ensure that the insertion of the plate does not affect the normal operation of the scanning electron microscope. The length and spacing of the plates have been optimized to ensure that1kVreach30kVThe best electron beam blocking efficiency can be achieved within the acceleration voltage range.

The entire bundle brake system includes onePCDPort adapter with scalable beam gate plate assembly and integrated pulse driver. Includes a remote pulse drive input and a small desktop controller. OptionalRS-232The interface allows direct control of the beam shutter system from computer-controlled electron microscopes or automatic electron beam lithography systems.

DebenElectron beam shutter can be used to blockSEMElectron beam (turning on and off the electron beam), this function is mainly used for electron beam exposure and engraving systems, as well as forEDX、CLorEBIC.

Instrument features：

• Integrated Faraday cup for easy detection of beam current
• Fast switch response and short time
• Electric plug-in electrode plate
• 5V TTLLevel control input
• OptionalRS-232Remote control
• Compatible with the highest electron microscope acceleration voltage30 kV
• Suitable for mostJEOLandHitachiElectron microscope

recommendapplication：

• Electron beam exposure（EBL）
• Cathodoluminescence（CL）
• EBICimaging/Voltage contrast imaging
• EDX
• Scanning Electron Acoustic Microscope

Optional five level beam current meter:n

• Automatic zeroing
• 25°CMaximum time error5pA
• Overload: Exceeding100μA
• Power: Battery4 x AAAlkaline batteries, typically working10000Hour by hour（1.2Year)
• Size:130mm(Width)x 70mm(High)x 115mm(Deep)

Note: United KingdomDEBEN PCDType beam brakes are usually compared to those in the United StatesNPGSNanographic Generator、EBICWaiting for the equipment to be used in conjunction.