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Address
Room 1106, Zone D, Youkou Industrial Park, No. 377 Chengpu Road, Fengxian District, Shanghai
Shanghai Huaji Electronic Technology Co., Ltd
Room 1106, Zone D, Youkou Industrial Park, No. 377 Chengpu Road, Fengxian District, Shanghai
Brand: Enke You(N&Q)
model:NXQ400-8
Origin: United States
Enkoyou lithography machines are divided into two series: semi-automatic and fully automatic. Among them,N&Q4000The series of lithography machines are mainly based on semi-automatic systems. The superior operability, ultra-high resolution, uniform optical system, modern advanced proximity and contact lithography, and ultra-high cost-effectiveness of this system make Enko Youlithography systemIt has been adopted by many famous enterprises, research centers, institutes, and universities across the country, and has become their preferred lithography system;
2、 Technical parameters:
1Chip size:5mm~200mmThe circular disc/Square and irregular fragments (supporting special chuck design for irregular fragments);
2Exposure wavelength:350nm-450nm(Other wavelengths are optional);
3Mercury lamp power:350W/500W(Other power options available);
4Resolution: superior to0.5um;
5Exposure mode: Supports proximity exposure, various contact types (vacuum contact, soft contact, hard contact, etc.) exposure;
6Range of emitted light intensity:10mW/cm2~55mW/ cm2@405nm;
7Support constant light intensity or constant power mode;
8Exposure time:0.1~999.9s;
9Alignment accuracy: Dual HD colorCCD +Dual high-definition color monitor with alignment accuracy of up to0.4Within micrometers;
10Mask size:2 x 2Inches to9 x 9inch(2 x 2Inches require a mask converter);
11Uniformity of light intensityUniformity:
<±1% over 2” Region;
<±2% over 4” Region;
<±3% over 6” Region;
12Double sided lithography: equipped with backside infrared alignment(IR BSA)Align with the optical backside(OBS BSA)Double sided alignment accuracy ≤2μm;
13Power supply: High sensitivity light intensity controllable power supply.
Optional models:
NXQ400-6
NXQ400-8
NXQ800-6
NXQ8006 Sapphire
NXQ800-8
3、 Product features:
Optional support for single-sided alignment and double-sided alignment design;
High definition color dualCCDThe lens adopts the most advanced split field microscope lens (based on infinite correction)CCDLens design); Dual head high-definition full-color objective lens (single field of view or split field of view can be flexibly selected by users);
High definition color dual display screen;
New pneumatic bearing guide railDesigned with high precision, low wear and tear, and no need for after-sales maintenance;
haveAutomatic executionWedge error compensation, and after levelingAutomatic positioningFunction;
Easy to operate, withSupport multiple operators to use on the same platformA user-friendly interface;
The control mode of the joystickUnique design;
useLEDPenetrating objective illumination technology, with super strong alignment brightness;
Adopting based onMicroscope lens with infinite distance correctionframework;
Anti diffraction reflectionEfficient optical path design;
Equipped with safety protection functionTemperature and airflow sensors;
Panoramic collimating lens with half angle deviation of light rays: < one point eight fourDegree;
Equipment stability and high durability;